Users info

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Before You Start

Cleanroom Work And Safety Protocol

Cleanroom Academic Work Model (Hebrew)

Equipment Booking

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Equipment Manuals

User's Manual Hmx

Plasma Asher Working Instructions

MSDS

Buffer HF Improved- Alfa Aesar

buffered oxide etch (HF) 6-1_ Avantor

CR-7 chromium etchant

Developer mr-Dev 600

Electroless Nickel plating solution

FOx 25 flowable oxide

gL Developer SDS

hydrochloric acid

hydrofluoric acid 49 precantage_2017

Hydrogen peroxide

Iodine Certified AR for analysis

KMPR Series Resists_2016

Megaposit_SPR_700-1.2 Positive Photoresist

Megaposit-SPR-220-3.0-Positive-Photoresist

Megaposit-SPR-220-7.0-Positive-Photoresist

Methyl Ethyl ketone

mf321_developer

MIBK_IPA_1_3 Developer

Microposit S1805 G2 Positive Photoresist

Microposit S1805

Microposit S1818 G2 Positive Photoresist

Microposit_S1813 G2 Positive Photoresist

Molykote PTFE-N-UV

mr-EBL 6000 Negative Photoresist

Nickel Etch TFG GHS

Phosphoric acid 85 precantage

Polydimethylsiloxane_hydroxy terminated_4200

Polydimethylsiloxane_trimethylsiloxy terminated_770

Polydimethylsiloxane_trimethylsiloxy terminated_6000

Polydimethylsiloxane_trimethylsiloxy terminated_17000

potassium hydroxide

potassium iodide

SU-8 2000 Thinner

SU8_2000_Series_Resists

SU8_3000_Series_Resists_USA

Titanium Etchant TFT GHS_b

Titanium Etchant TFTN GHS_b

XP MicroSpray SU-8 Photoresist Spray

XR-1541-006 E-Beam resist in MIBK_2014

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Process Templates / Best Known Methods

Mask Design Rules

Lithography Basic Method

VST Template Recipes

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Training Materials

EBPG Reference Manual